Ninth Topical Conference on Quantitative Surface Analysis
Sponsored by the AVS Applied Surface Science Division
Holiday Inn Express, 17035 Condit Road, Morgan Hill (near San Jose), California 95037
Friday and Saturday, October 26 and 27, 2001
This conference will provide a forum for discussion on the
quantitative aspects of surface analysis and on surface, interface, and
thin-film characterization at high spatial resolution. In many current
technological applications, materials are used with such small layer
thicknesses that there is little distinction between surface, interface and
thin-film properties, and the same analytical methods can be used for materials
characterization. Particular attention will be given to recent successes and
current challenges in materials characterization for important technologies.
The program will consist of invited presentations and a poster session of contributed papers (including demonstrations of databases and software). Each invited paper will each be followed by an extended discussion period. A prize will be given for the best student paper in the poster session.
1. Characterization of Technological Materials (Friday morning)
J. B. Bindell (Agere Systems): "Emerging Needs for Characterization of Devices at High Spatial Resolution”
A. Spool (IBM): “Characterizing GMR Metal Multi-Layers”
B. Stoehr (Applied Materials): “Analytical Challenges in Advanced Photomask Manufacturing”
2. AES, XPS, and Poster Session (Friday afternoon)
W. S. M. Werner (Technical University of Vienna, Austria): “Quantitative Interpretation of the Energy and Angular Distributions of Auger- and Photo-Electrons Emitted from Solid Surfaces”
Poster session of contributed papers (including demonstrations of software and databases)
3. SIMS (Saturday morning)
M. Nicholas (AstraZeneca, Sweden): "Imaging, Chemometrics, and Static SIMS Quantification”
E. Niehuis (ION-TOF, Germany): "New Developments in Ultra-Thin Layer Analysis by SIMS"
4. Characterization of Gate Oxides (Saturday afternoon)
D. W. Moon (Korea Research Institute of Standards and Science): “Complementary Use of MEIS and SIMS for the Analysis of Ultra-Thin Gate Oxides and Shallow Junctions”
A. C. Diebold (International SEMATECH): “Comparison of Materials Characterization and Metrology Measurement Methods for Silicon Dioxide, Silicon Oxynitride, and High Dielectric Constant Thin Films”
The submission of contributed papers on conference topics for the poster session is invited. Submissions that involve demonstrations of software or databases are encouraged. Abstracts of 200-300 words should be prepared as Word files and sent by email to cedric.powell@nist.gov by September 14. Each abstract should show the title, author names (with the presenting author underlined), and authors’ affiliations, and the email should include telephone and Fax numbers for the presenting author. A prize will be awarded for the best paper by a student; entries for this competition should be identified at the time of submission.
Inquiries on the program can be sent to Cedric Powell. Further information on registration and lodging, including registration forms, can be obtained from Dick Brundle, Applied Materials, M/S 0102, 3050 Bowers Ave., Santa Clara, CA 95054 (email: dick_brundle@amat.com, phone: 408-748-5083, fax: 408-294-3353).