Technical
Program
Format: Presentation/discussion/demonstration
Understanding the Accuracy Barrier of Quantitative Electron Beam X-ray Microanalysis
and the Role of Standards
April 8-11, 2002
Monday, April 8
8:00-9:00 am Registration
9:00-9:10 Welcome and Introduction: Dale Newbury
I. Defining the Problem
9:10-9:45 Kurt F.J. Heinrich Errors in Quantitative Microanalysis
(NIST, ret.)
9:55-10:35 Peter Rez Accurate Cross Sections For Microanalysis
(Arizona St. U.)
10:45 --11:00 Break
11:00-11:40 Eric Lifshin How detectability limits and spatial resolution for chemical
(SUNY Albany) analysis relate to precision
II. Measuring the x-ray intensity: Instrumentation limitations
11:45-12:25 John Armstrong EPMA Measurement Limitations
(NIST)
12:30-1:30 Lunch: NIST Cafeteria
1:30-2:05 Terry Williams Optimization of WD analysis conditions
(Nat. Hist. Mus., London)
for Stephen Reed
(U. Cambridge)
2:10-2:45 Chuck Herrington Advanced Electronics for Pulse Processing
(Geller Microanaly. Lab.)
2:50-3:10 Break
III. Spectral Processing
3:10-3:45 Robert Myklebust WDS Spectral Fitting
(NIST, ret.)
3:50-4:25 Peter Statham Extracting EDS Intensities
(LINK)
4:30-5:30 Panel Discussion What Industry Needs
Tuesday, April 9
IV. Processing the data: matrix corrections
8:30-9:05 John Armstrong Matrix corrections: comparison of methods
(NIST)
9:10-9:45 John Donovan Backscatter averaging in compounds- how should backscatter
(U. Oregon) loss be calculated in the atomic number correction
9:45-10:00 Discussion
10:00-10:15 Break
V. Quantitative X-ray Microanalysis Under Extreme Conditions: the Lunatic Fringe
10:15-10:50 John Small Particles and Rough Surfaces
(NIST)
10:55-11:30 Dale Newbury X-ray Microanalysis in the Variable Pressure (VPSEM) and
(NIST)
Environmental Scanning Electron
Microscopes (ESEM)
11:35–12:10 Robert Carlton Accuracy and Precision of Quantitative X-ray Analysis using
(Lehigh U.) the Environmental Scanning Electron Microscope
12:10-12:30 Discussion
12:30-1:30 Lunch
1:30-2:05 Dale Newbury X-ray Microanalysis in Extreme Conditions: Low Voltage SEM
(NIST)
VI. Future Directions: Advanced x-ray spectroscopy
2:10-2:45 Jan Iwanczyk Silicon Drift Detectors
(Photon Imaging)
2:50-3:25 Kent Irwin The NIST Microcalorimeter
(NIST)
3:30-4:05 Del Redfern The Microcalorimeter for Industrial Applications
(EDAX)
4:05-4:30 Discussion
4:30-5:45 Laboratory Tours: NIST Microcalorimeter and Photon Imaging Silicon Drift Detector
Wednesday, April 10
Standards Needs
8:20 Introduction: Ryna B. Marinenko
I. Sample Preparation of Standard Materials
8:30-9:00 Joseph D. Geller Sample Preparation Techniques for Electron Probe Microanalysis
(Geller Microanal.)
9:00-9:40 Guy Remond, Polishing Techniques and Implications in Quantitative Microanalysis
(U. Tech. Sidney, Visiting Prof.)
9:40-10:00 Eric Windsor SRM 482: The Effect of Sample Preparation Artifacts on the
(NIST) Micro-Homogeneity of a Standard Reference Material
10:00-10:20 Discussion on Preparation Techniques
10:20-10:35 Break
10:35-11:45 George Vander Voort Specimen Preparation for Electron Microprobe Analysis
(Buehler)
11:45-12:05 Discussion on Preparation Techniques
12:05-1:15 Lunch
II. Standard Materials – Availability and Use
1:15-1:40 Gene Jarosewich Mineral Microanalysis Standards from the Museum of Natural
(Smith. Inst.) History, Smithsonian Institution.
1:40-2:05 Greg Meeker Standards for the Analysis of Geological and Ceramic Materials.
(U.S. Geolog. Surv.)
2:05-2:30 Ryna Marinenko NIST Standards for Microanalysis and the Certification Process
(NIST)
2:30-2:50 Reference Material Needs Discussion
2:50-3:05 Break
III. Characterization of Reference Materials
3:05-3:25 John Donovan A Re-Examination Of The Rare-Earth Element Reference Standards
(U. Oregon) For The Electron Microprobe
3:25-3:55 Paul Carpenter Characterization of Corning EPMA Standard Glasses 95IRV, 95IRW,
(NASA) and 95IRX
3:55-4:25 E. P. Vicenzi, Characterization of Corning Archeological Reference Glasses using
(Smith. Inst.) Microbeam Techniques.