Absorption Sensitivity and Spatial Resolution in Near-Field Infrared Spectroscopy

C. A. Michaels and S. J. Stranick.

Objective: To benchmark the instrumental capabilities of an infrared scanning near-field microscope (IR NSOM) that utilizes IR absorption as a chemical contrast mechanism. Key characteristics to be assessed include absorption sensitivity, attainable spatial resolution, and the sensitivity of near-field IR absorption microscopy to topographic artifacts.

Problem: The integration of IR absorption spectroscopy into near-field scanning optical microscopy is a promising approach to in-situ, non-destructive, high spatial resolution imaging, with applications in the chemical characterization of materials and nanotechnology. The combination of the sub-diffraction spatial resolution attainable in the near-field with the high chemical specificity of vibrational spectroscopy promises customers in the US chemical industry a powerful new analytical instrument that surmounts critical measurement limitations of both far-field IR microscopes (low spatial resolution) and scanned probe microscopes (lack of chemical specificity). However, a quantitative assessment of critical performance characteristics of this microscope is required.

Approach: Spatial resolution and probe quality are evaluated by analysis of controlled polarization, near-field transmission images of a thin micropatterned gold film. Absorption sensitivity is estimated from near-field spectra of thin polymer films in the aliphatic C-H stretching region at 3.4 mm. Analysis of a series of near-field spectra, recorded as a function of probe-sample separation, yield insight into the degree to which IR absorption imaging is subject to topographic artifacts.

Figure 1. Near-field infrared absorption spectrum of a 2 mm thick polystyrene film in the aliphatic C-H stretching region. Results and Future Plans: Near-field transmission images of a micropatterned thin gold film on silicon allow a quantitative assessment of both the probe aluminum coating integrity and the demonstrated spatial resolution, free from complications due to topographic artifacts. Probes are routinely fabricated which allow imaging with a conservatively estimated spatial resolution of 350 nm to 500 nm and sufficient aperture throughput to allow high signal-to-noise spectral measurements. Figure 1 is a near-field absorption spectrum of a 2 mm thick polystyrene film recorded in 1 s, within the broad bandwidth of the laser pulse. This spectra demonstrates that the microscope sensitivity is sufficiently high to allow spectral measurements of samples of sub-wavelength thickness, thus meeting the requirement for high spatial resolution, near-field absorption imaging. The film thickness detection limit for absorption in the C-H stretch band of polystyrene is estimated at 200 nm. Spectral retraction curves indicate that baseline corrected, infrared absorption amplitudes are relatively insensitive to changes in tip-sample separation, suggesting that near-field absorption imaging may be less sensitive to topographic artifacts than other near-field imaging modes. Future plans involve the exploration of apertureless near-field and confocal IR imaging techniques.

Publications:

Scanning Near-Field Infrared Microscopy and Spectroscopy with a Broadband Laser Source, C. A. Michaels, S. J. Stranick, L. J. Richter and R. R. Cavanagh, J. Appl. Phys. 88, 4832 (2000).

Chemical Imaging with Scanning Near-Field Infrared Microscopy and Spectroscopy, C. A. Michaels, S. J. Stranick, L. J. Richter and R. R. Cavanagh, Proc. SPIE. 4098, 102 (2000).

 


Back to Surface and Interface Research Group Home Page
 
Comments or suggestions regarding this WEB page may be e-mailed to sirgwebmaster@nist.gov
last updated 12/18/2000